CVD
Chemical vapor deposition is a traditional technique for preparing thin films. Its principle is to use gaseous precursor reactants to decompose certain components in the gaseous precursor through chemical reactions between atoms and molecules, forming thin films on the substrate.
PVD
vacuum coating technology is mainly divided into three categories: vacuum evaporation coating, vacuum technology and coating, and vacuum ion coating. The main methods of physical vapor deposition include vacuum evaporation, sputtering coating, arc plasma coating, ion coating, and molecular beam epitaxy.
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